| dc.contributor.author | Xu, Dongbo | |
| dc.contributor.author | Gillijns, Werner | |
| dc.contributor.author | Tan, Ling Ee | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | Kim, Ryan Ryoung han | |
| dc.contributor.editor | Ronse, Kurt | |
| dc.contributor.editor | Naulleau, Patrick | |
| dc.contributor.editor | Gargini, Paolo | |
| dc.contributor.editor | Itani, Toshiro | |
| dc.contributor.editor | Hendrickx, Eric | |
| dc.date.accessioned | 2022-06-24T07:45:50Z | |
| dc.date.available | 2022-05-22T02:19:05Z | |
| dc.date.available | 2022-05-23T08:37:37Z | |
| dc.date.available | 2022-06-24T07:45:50Z | |
| dc.date.issued | 2021-10-12 | |
| dc.identifier.isbn | 978-1-5106-4552-3 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.other | WOS:000792657300012 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39865.3 | |
| dc.source | WOS | |
| dc.title | Exploration of Alternative Mask for 0.33NA EUV Single Patterning at Pitch 28nm | |
| dc.type | Proceedings paper | |
| dc.contributor.imecauthor | Xu, Dongbo | |
| dc.contributor.imecauthor | Gillijns, Werner | |
| dc.contributor.imecauthor | Tan, Ling Ee | |
| dc.contributor.imecauthor | Philipsen, Vicky | |
| dc.contributor.imecauthor | Kim, Ryan Ryoung han | |
| dc.contributor.orcidimec | Xu, Dongbo::0000-0003-1159-2315 | |
| dc.contributor.orcidimec | Gillijns, Werner::0000-0002-2430-7360 | |
| dc.contributor.orcidimec | Tan, Ling Ee::0000-0002-3143-5176 | |
| dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
| dc.identifier.doi | 10.1117/12.2599054 | |
| dc.identifier.eisbn | 978-1-5106-4553-0 | |
| dc.source.numberofpages | 13 | |
| dc.source.peerreview | no | |
| dc.source.conference | International Conference on Extreme Ultraviolet Lithography | |
| dc.source.conferencedate | SEP 27-OCT 01, 2021 | |
| dc.source.conferencelocation | online | |
| dc.source.journal | SPIE paper | |
| dc.source.volume | 11854 | |
| imec.availability | Published - open access | |
