Exploration of Alternative Mask for 0.33NA EUV Single Patterning at Pitch 28nm

Notice

This item has not yet been validated by imec staff.

This is not the latest version of this item. The latest version can be found at: https://imec-publications.be/handle/20.500.12860/39865.3

dc.contributor.author	Xu, Dongbo
dc.contributor.author	Gillijns, Werner
dc.contributor.author	Tan, Ling Ee
dc.contributor.author	Philipsen, Vicky
dc.contributor.author	Kim, Ryoung-han
dc.date.accessioned	2022-05-22T02:19:05Z
dc.date.available	2022-05-22T02:19:05Z
dc.date.issued	2021
dc.identifier.isbn	978-1-5106-4552-3
dc.identifier.issn	0277-786X
dc.identifier.other	WOS:000792657300012
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/39865
dc.source	WOS
dc.title	Exploration of Alternative Mask for 0.33NA EUV Single Patterning at Pitch 28nm
dc.type	Proceedings paper
dc.contributor.imecauthor	Xu, Dongbo
dc.contributor.imecauthor	Gillijns, Werner
dc.contributor.imecauthor	Tan, Ling Ee
dc.contributor.imecauthor	Philipsen, Vicky
dc.contributor.imecauthor	Kim, Ryoung-han
dc.contributor.orcidimec	Xu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimec	Gillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimec	Tan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimec	Philipsen, Vicky::0000-0002-2959-432X
dc.identifier.doi	10.1117/12.2599054
dc.identifier.eisbn	978-1-5106-4553-0
dc.source.numberofpages	13
dc.source.peerreview	yes
dc.source.conference	International Conference on Extreme Ultraviolet Lithography
dc.source.conferencedate	SEP 27-OCT 01, 2021
dc.source.volume	11854
imec.availability	Under review

Files in this item

Files	Size	Format	View
There are no files associated with this item.

Version	Item	Date	Summary
3	20.500.12860/39865.3	2022-06-24T07:42:39Z	validation by library/open access desk
2	20.500.12860/39865.2	2022-05-23T08:29:55Z	validation by imec author
1	20.500.12860/39865*	2022-05-22T02:19:05Z

*Selected version