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Impact of mask corner rounding on pitch 40 nm contact hole variability

dc.contributor.authorvan Look, Lieve
dc.contributor.authorGillijns, Werner
dc.contributor.authorGallagher, Emily
dc.date.accessioned2023-01-19T14:20:07Z
dc.date.available2022-05-22T02:19:05Z
dc.date.available2023-01-19T14:20:07Z
dc.date.issued2021
dc.identifier.isbn978-1-5106-4552-3
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000792657300002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39866.2
dc.sourceWOS
dc.titleImpact of mask corner rounding on pitch 40 nm contact hole variability
dc.typeProceedings paper
dc.contributor.imecauthorvan Look, Lieve
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorGallagher, Emily
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.identifier.doi10.1117/12.2601850
dc.identifier.eisbn978-1-5106-4553-0
dc.source.numberofpages10
dc.source.peerreviewyes
dc.source.beginpage1185406
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 27-OCT 01, 2021
dc.source.conferencelocationVirtual
dc.source.journalProceedings of SPIE
dc.source.volume11854
imec.availabilityPublished - imec


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220.500.12860/39866.2*2023-01-19T14:19:26Zvalidation by library/open access desk
120.500.12860/398662022-05-22T02:19:05Z

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