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Deep learning-based defect detection using large FOV SEM for 28 nm pitch BEOL layer patterned with 0.33NA single exposure EUV
dc.contributor.author | Das, Sayantan | |
dc.contributor.author | Sah, Kaushik | |
dc.contributor.author | Liang, Ardis | |
dc.contributor.author | Roy, Hemanta | |
dc.contributor.author | Tran, Kha | |
dc.contributor.author | Babu, Binesh | |
dc.contributor.author | Hegde, Arjun | |
dc.contributor.author | Cross, Andrew | |
dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Halder, Sandip | |
dc.date.accessioned | 2022-05-22T02:19:06Z | |
dc.date.available | 2022-05-22T02:19:06Z | |
dc.date.issued | 2021 | |
dc.identifier.isbn | 978-1-5106-4552-3 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000792657300014 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39870 | |
dc.source | WOS | |
dc.title | Deep learning-based defect detection using large FOV SEM for 28 nm pitch BEOL layer patterned with 0.33NA single exposure EUV | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Das, Sayantan | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.imecauthor | Halder, Sandip | |
dc.contributor.orcidimec | Das, Sayantan::0000-0002-3031-0726 | |
dc.contributor.orcidimec | Leray, Philippe::0000-0002-1086-270X | |
dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
dc.identifier.doi | 10.1117/12.2600954 | |
dc.identifier.eisbn | 978-1-5106-4553-0 | |
dc.source.numberofpages | 11 | |
dc.source.peerreview | yes | |
dc.source.conference | International Conference on Extreme Ultraviolet Lithography | |
dc.source.conferencedate | SEP 27-OCT 01, 2021 | |
dc.source.volume | 11854 | |
imec.availability | Under review |
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