dc.contributor.author | Das, Argho | |
dc.contributor.author | Blanco, Victor | |
dc.contributor.author | Das, Sayantan | |
dc.contributor.author | Kissoon, Nicola | |
dc.contributor.author | Halder, Sandip | |
dc.contributor.author | Dusa, Mircea | |
dc.date.accessioned | 2023-01-19T14:24:35Z | |
dc.date.available | 2022-05-22T02:19:15Z | |
dc.date.available | 2023-01-19T14:24:35Z | |
dc.date.issued | 2021 | |
dc.identifier.isbn | 978-1-5106-4552-3 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000792657300022 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39875.2 | |
dc.source | WOS | |
dc.title | iN5 EUV Single Expose Patterning Evaluation for Via Layers | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Das, Argho | |
dc.contributor.imecauthor | Blanco, Victor | |
dc.contributor.imecauthor | Das, Sayantan | |
dc.contributor.imecauthor | Halder, Sandip | |
dc.contributor.imecauthor | Dusa, Mircea | |
dc.contributor.orcidimec | Das, Argho::0000-0003-3804-1919 | |
dc.contributor.orcidimec | Blanco, Victor::0000-0003-4308-0381 | |
dc.contributor.orcidimec | Das, Sayantan::0000-0002-3031-0726 | |
dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
dc.identifier.doi | 10.1117/12.2600938 | |
dc.identifier.eisbn | 978-1-5106-4553-0 | |
dc.source.numberofpages | 11 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1185418 | |
dc.source.conference | International Conference on Extreme Ultraviolet Lithography | |
dc.source.conferencedate | SEP 27-OCT 01, 2021 | |
dc.source.conferencelocation | Virtual | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 11854 | |
imec.availability | Published - imec | |