Calibration and application of Gaussian random field models for exposure and resist stochastic in EUV lithography
dc.contributor.author | Wei, Chih-, I | |
dc.contributor.author | Latypov, Azat | |
dc.contributor.author | De Bisschop, Peter | |
dc.contributor.author | Khaira, Gurdaman | |
dc.contributor.author | Fenger, Germain | |
dc.date.accessioned | 2023-01-05T12:44:20Z | |
dc.date.available | 2022-06-07T02:20:18Z | |
dc.date.available | 2023-01-05T12:44:20Z | |
dc.date.issued | 2022 | |
dc.identifier.issn | 0021-4922 | |
dc.identifier.other | WOS:000801214000001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39925.2 | |
dc.source | WOS | |
dc.title | Calibration and application of Gaussian random field models for exposure and resist stochastic in EUV lithography | |
dc.type | Journal article review | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.contributor.orcidimec | De Bisschop, Peter::0000-0002-8297-5076 | |
dc.identifier.doi | 10.35848/1347-4065/ac54f5 | |
dc.source.numberofpages | 12 | |
dc.source.peerreview | yes | |
dc.source.beginpage | SD0806 | |
dc.source.endpage | na | |
dc.source.journal | JAPANESE JOURNAL OF APPLIED PHYSICS | |
dc.source.issue | SD | |
dc.source.volume | 61 | |
imec.availability | Published - open access | |
dc.description.wosFundingText | The authors would like to express their gratitude to Dr. Seiji Nagahara, Tokyo Electron Limited, the Japan Applied Physics Society and the Secretariat of the MNC 2021 conference for the invitation to present at the MNC 2021 conference leading to this publication. The authors would like to thank Qijian Wan, WenMing Wu and Ao Chen and for the programing support of experimental stochastic bands extraction. Thanks to Rajiv Sejpal from RIT, and Werner Gillijns, Sayantan Das from IMEC, and Seulki Kang, Yosuke Okamoto, Kotaro Maruyama from TASMIT for supporting the wafer data. This project has received funding from the ECSEL Joint Undertaking (JU) under grant agreement No 783247. The JU receives support from the European Union's Horizon 2020 research and innovation program and Netherlands, Belgium, Germany, France, Austria, United Kingdom, Israel, Switzerland. |