Browsing Conference contributions by imec author "187beec6129b2b8c842a0a80ab643a1f75895fbf"
Now showing items 1-4 of 4
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Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry
Dorney, Kevin; Kissoon, Nicola; Holzmeier, Fabian; Witting Larsen, Esben; Singh, Dhirendra; Arvind, Shikhar; Santra, Sayantani; Fallica, Roberto; Makhotkin, Igor; Philipsen, Vicky; De Gendt, Stefan; Fleischmann, Claudia; van der Heide, Paul; Petersen, John (2023-04-28) -
Advancing X-ray metrology for routine thin film analysis
Makhotkin, Igor; Fathabad, Zahra; Yakunin, Sergey; van de Kruijs, Robbert; Philipsen, Vicky; Luong, Vu; Bijkerk, Fred (2018) -
High NA EUV lithography simulation using new calibrated mask model
Wu, Meiyi; Makhotkin, Igor; Philipsen, Vicky; Soltwisch, Victor; Scholze, Frank (2019) -
The refined EUVL mask model
Makhotkin, Igor; Wu, Meiyi; Philipsen, Vicky; Soltwisch, Victor; Scholze, Frank (2019)