Now showing items 61-71 of 71

    • Spintronic majority gates 

      Radu, Iuliana; Zografos, Odysseas; Vaysset, Adrien; Ciubotaru, Florin; Yan, Jingdong; Swerts, Johan; Radisic, Dunja; Briggs, Basoene; Soree, Bart; Manfrini, Mauricio; Ercken, Monique; Wilson, Chris; Raghavan, Praveen; Sayan, Safak; Adelmann, Christoph; Thean, Aaron; Amaru, L.; Gaillardon, P.E.; De Micheli, G.; Nikonov, D.E.; Manipatruni, S.; Young, I.A. (2015)
    • Studies of the defectivity formation mechanismes between the top coats and the resists in immersion lithography 

      Stepanenko, Nickolay; Kishimura, Shinji; Gronheid, Roel; Maenhoudt, Mireille; Ercken, Monique; Kocsis, Michael; Vandenbroeck, Nadia; Van Den Heuvel, Dieter; Benndorf, Michael (2005)
    • Subtractive etch of ruthenium for sub-5nm interconnect 

      Wan, Danny; Paolillo, Sara; Rassoul, Nouredine; Kutrzeba Kotowska, Bogumila; Blanco, Victor; Adelmann, Christoph; Lazzarino, Frederic; Ercken, Monique; Murdoch, Gayle; Boemmels, Juergen; Wilson, Chris; Tokei, Zsolt (2018)
    • Supervia Process Integration and Reliability Compared to Stacked Vias Using Barrierless Ruthenium 

      Vega Gonzalez, Victor; Puliyalil, Harinarayanan; Versluijs, Janko; Lesniewska, Alicja; Varela Pedreira, Olalla; Baert, Rogier; Paolillo, Sara; Decoster, Stefan; Schleicher, Filip; Montero Alvarez, Daniel; Bekaert, Joost; Kesters, Els; Le, Quoc Toan; Lorant, Christophe; Teugels, Lieve; Heylen, Nancy; Jourdan, Nicolas; El-Mekki, Zaid; van der Veen, Marleen; Ciofi, Ivan; Briggs, Basoene; Heijlen, Jeroen; Dupas, Luc; De Wachter, Bart; Vancoille, Eric; Webers, Tomas; Vats, Hemant; Rynders, Luc; Cupak, Miroslav; Lee, Jae Uk; Drissi, Youssef; Halipre, Luc; Charley, Anne-Laure; Verdonck, Patrick; Witters, Thomas; Van Gompel, Sander; Kimura, Yosuke; Demonie, Ingrid; Lazzarino, Frederic; Ercken, Monique; Kim, Ryan Ryoung han; Trivkovic, Darko; Croes, Kristof; Leray, Philippe; Jaysankar, Manoj; Wilson, Chris; Murdoch, Gayle; Tokei, Zsolt (2020)
    • The impact of hyper NA immersion lithography to reticles and design 

      Ronse, Kurt; Cheng, Shaunee; Ercken, Monique; Leunissen, Peter; Maenhoudt, Mireille; Vandenberghe, Geert; Yoshizawa, Masaki (2005)
    • The influence of wafer soaking and top coat processing on resist profile control in immersion lithography 

      Foubert, Philippe; Vandenbroeck, Nadia; Delvaux, Christie; Pollentier, Ivan; Ercken, Monique (2005)
    • Three-layer BEOL process integration with supervia and self-aligned-block options for the 3nm node 

      Vega Gonzalez, Victor; Wilson, Chris; Briggs, Basoene; Decoster, Stefan; Versluijs, Janko; Lesniewska, Alicja; Paolillo, Sara; Baert, Rogier; Puliyalil, Harinarayanan; Bekaert, Joost; Kesters, Els; Le, Quoc Toan; Lorant, Christophe; Varela Pedreira, Olalla; Teugels, Lieve; Heylen, Nancy; El-Mekki, Zaid; van der Veen, Marleen; Webers, Tomas; Vats, Hemant; Rynders, Luc; Cupak, Miroslav; Lee, Jae Uk; Drissi, Youssef; Halipre, Luc; Charley, Anne-Laure; Verdonck, Patrick; Witters, Thomas; Van Gompel, Sander; Kimura, Yosuke; Jourdan, Nicolas; Ciofi, Ivan; Gupta, Anshul; Contino, Antonino; Boccardi, Guillaume; Lariviere, Stephane; Dupas, Luc; De Wachter, Bart; Vancoille, Eric; Lazzarino, Frederic; Ercken, Monique; Debacker, Peter; Kim, Ryan Ryoung han; Trivkovic, Darko; Croes, Kristof; Leray, Philippe; Dillemans, Leander; Chen, Yi-Fan; Tokei, Zsolt (2019)
    • Transfer of line edge roughness during gate patterning processes 

      Leunissen, Peter; Ercken, Monique; Ronse, Kurt; Derksen, Giljam B. (2004)
    • Tuning and simulating a 193nm resist for 2D applications 

      Howard, W.; Wiaux, Vincent; Ercken, Monique; Bui, B.; Byers, J.D.; Pochkowski, M. (2002)
    • Variable threshold resist models for lithography simulation 

      Randall, John; Ronse, Kurt; Marschner, Thomas; Goethals, Mieke; Ercken, Monique (1999)
    • Vertical nanowire FET integration and device aspects 

      Veloso, Anabela; Altamirano Sanchez, Efrain; Brus, Stephan; Chan, BT; Cupak, Miroslav; Dehan, Morin; Delvaux, Christie; Devriendt, Katia; Eneman, Geert; Ercken, Monique; Huynh Bao, Trong; Ivanov, Tsvetan; Matagne, Philippe; Merckling, Clement; Paraschiv, Vasile; Ramesh, Siva; Rosseel, Erik; Rynders, Luc; Sibaja-Hernandez, Arturo; Suhard, Samuel; Tao, Zheng; Vecchio, Emma; Waldron, Niamh; Yakimets, Dmitry; De Meyer, Kristin; Mocuta, Dan; Collaert, Nadine; Thean, Aaron (2016)