Now showing items 1-3 of 3

    • Enabling 3-level High Aspect Ratio Supervias for 3nm nodes and below 

      Montero Alvarez, Daniel; Vega Gonzalez, Victor; Feurprier, Yannick; Varela Pedreira, Olalla; Oikawa, Noriaki; Martinez Alanis, Gerardo Tadeo; Batuk, Dmitry; Puliyalil, Harinarayanan; Versluijs, Janko; De Coster, Hanne; Bazzazian, Nina; Jourdan, Nicolas; Kumar, Kaushik; Lazzarino, Frederic; Murdoch, Gayle; Park, Seongho; Tokei, Zsolt (2022-06-29)
    • High Aspect Ratio Supervia Dual Damascene etch for iN5 and beyond 

      Puliyalil, Harinarayanan; Feurprier, Yannick; Oikawa, Noriaki; Vega Gonzalez, Victor; Briggs, Basoene; Montero Alvarez, Daniel; Lazzarino, Frederic; Tokei, Zsolt; Satoru, Nakamura; Tahara, Shigeru; Kumar, Kaushik (2021)
    • Impact of local variability on defect-aware process windows 

      Maslow, Mark John; Yaegashi, Hidetami; Frommhold, Andreas; Schiffelers, Guido; Wahlisch, Felix; Rispens, Gijsbert; Slachter, Bram; Yoshida, Keisuke; Hara, Arisa; Oikawa, Noriaki; Pathak, Abhinav; Cerbu, Dorin; Hendrickx, Eric; Bekaert, Joost (2019)