Now showing items 1-3 of 3

    • High-k dielectrics integration prospects 

      Kubicek, Stefan; Van Elshocht, Sven; Delabie, Annelies; Yamamoto, Kazuhiko; Beckx, Stephan; Claes, Martine; Van Hoornick, Nausikaa; Kwak, Dong Hwa; Hyun, Sangjin; Rothschild, Aude; Veloso, Anabela; Kottantharayil, Anil; Lujan, Guilherme; Kittl, Jorge; Lauwers, Anne; Kaushik, Vidya; Niwa, Masaaki; De Gendt, Stefan; Heyns, Marc; Jurczak, Gosia; Biesemans, Serge (2005)
    • Ni-FUSI on high-k as a candidate for 65nm LSTP CMOS 

      Kubicek, Stefan; Veloso, Anabela; Kottantharayil, Anil; Hayashi, Shigenori; Yamamoto, Kazuhiko; Mitsuhashi, Riichirou; Kittl, Jorge; Lauwers, Anne; Horii, S.; Harada, Y.; Kubota, M.; Niwa, Masaaki; De Gendt, Stefan; Heyns, Marc; Jurczak, Gosia; Biesemans, Serge (2005-04)
    • Prospect of Hf-based gate dielectric by PVD with FUSI gate for LSTP application 

      Niwa, Masaaki; Mitsuhashi, Riichirou; Yamamoto, Kazuhiko; Hayashi, S.; Harada, Y.; Kubota, M.; Rothschild, Aude; Hoffmann, Thomas Y.; Kubicek, Stefan; De Gendt, Stefan; Heyns, Marc; Biesemans, Serge (2005)