Publication:

Prospect of Hf-based gate dielectric by PVD with FUSI gate for LSTP application

Date

2005
Meeting abstract
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Author(s)

Niwa, Masaaki
;
Mitsuhashi, Riichirou
;
Yamamoto, Kazuhiko
;
Hayashi, S.
;
Harada, Y.
;
Kubota, M.
;
Rothschild, Aude
;
Hoffmann, Thomas Y.
;
Kubicek, Stefan  
;
De Gendt, Stefan  
;
Heyns, Marc  
;
Biesemans, Serge  

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Abstract

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