Prospect of Hf-based gate dielectric by PVD with FUSI gate for LSTP application

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Authors
Niwa, Masaaki; Mitsuhashi, Riichirou; Yamamoto, Kazuhiko; Hayashi, S.; Harada, Y.; Kubota, M.; Rothschild, Aude; Hoffmann, Thomas Y.; Kubicek, Stefan; De Gendt, Stefan; Heyns, Marc; Biesemans, Serge
Conference
Meeting Abstracts 208th Meeting of the Electrochemical Society
Title
Prospect of Hf-based gate dielectric by PVD with FUSI gate for LSTP application
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Meeting abstract
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