The use of ozonated water as a resist strip and post ash clean in a production fab

Thumbnail
View/open
Metadata
Show full item record
Authors
Vroom, R.; De Gendt, Stefan
Conference
Proceedings 1999 IEEE International Symposium on Semiconductor Manufacturing Conference
Title
The use of ozonated water as a resist strip and post ash clean in a production fab
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections