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Improving Silicon-photonics inverse-design printability by leveraging SEM contours for advanced Optical Proximity Correction techniques

dc.contributor.authorDrissi, Youssef
dc.contributor.authorGillijns, Werner
dc.contributor.authorLardenois, Sebastien
dc.contributor.authorVerheyen, Peter
dc.contributor.authorLepage, Guy
dc.contributor.authorMohsen, Mahmoud
dc.contributor.authorDelorme, Maxence
dc.date.accessioned2023-06-05T14:47:00Z
dc.date.available2022-08-11T02:41:30Z
dc.date.available2023-06-05T14:47:00Z
dc.date.issued2022
dc.identifier.isbn978-1-5106-4895-1
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000831704500007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40241.2
dc.sourceWOS
dc.titleImproving Silicon-photonics inverse-design printability by leveraging SEM contours for advanced Optical Proximity Correction techniques
dc.typeProceedings paper
dc.contributor.imecauthorDrissi, Youssef
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorLardenois, Sebastien
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorLepage, Guy
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecLardenois, Sebastien::0000-0001-8404-5676
dc.contributor.orcidimecVerheyen, Peter::0000-0002-8245-9442
dc.identifier.doi10.1117/12.2609092
dc.identifier.eisbn978-1-5106-4896-8
dc.source.numberofpages10
dc.source.peerreviewyes
dc.source.beginpage1201208
dc.source.conferenceConference on Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XV Part of SPIE Photonics West OPTO Conference
dc.source.conferencedateJAN 22-FEB 24, 2022
dc.source.conferencelocationSan Francisco
dc.source.journalProceedings of SPIE
dc.source.volume12012
imec.availabilityPublished - imec


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220.500.12860/40241.2*2023-06-05T14:45:29Zvalidation by library/open access desk
120.500.12860/402412022-08-11T02:41:30Z

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