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Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design
dc.contributor.author | Xu, Dongbo | |
dc.contributor.author | Gillijns, Werner | |
dc.contributor.author | Tan, Ling Ee | |
dc.contributor.author | Philipsen, Vicky | |
dc.contributor.author | Kim, Ryoung-Han | |
dc.date.accessioned | 2022-08-12T02:39:07Z | |
dc.date.available | 2022-08-12T02:39:07Z | |
dc.date.issued | 2022-APR 1 | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.other | WOS:000835428700017 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40250 | |
dc.source | WOS | |
dc.title | Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design | |
dc.type | Journal article | |
dc.contributor.imecauthor | Xu, Dongbo | |
dc.contributor.imecauthor | Gillijns, Werner | |
dc.contributor.imecauthor | Tan, Ling Ee | |
dc.contributor.imecauthor | Philipsen, Vicky | |
dc.contributor.imecauthor | Kim, Ryoung-Han | |
dc.contributor.orcidimec | Xu, Dongbo::0000-0003-1159-2315 | |
dc.contributor.orcidimec | Gillijns, Werner::0000-0002-2430-7360 | |
dc.contributor.orcidimec | Tan, Ling Ee::0000-0002-3143-5176 | |
dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
dc.identifier.doi | 10.1117/1.JMM.21.2.024401 | |
dc.source.numberofpages | 15 | |
dc.source.peerreview | yes | |
dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
dc.source.issue | 2 | |
dc.source.volume | 21 | |
imec.availability | Under review |
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