Toggle navigation
My submissions
Login
Toggle navigation
View item
imec Publications Repository
imec Publications
Articles
View item
imec Publications Repository
imec Publications
Articles
View item
JavaScript is disabled for your browser. Some features of this site may not work without it.
Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design
View/
open
Published version (5.545Mb)
Metadata
Show full item record
Authors
Xu, Dongbo
;
Gillijns, Werner
;
Tan, Ling Ee
;
Philipsen, Vicky
;
Kim, Ryan Ryoung han
DOI
10.1117/1.JMM.21.2.024401
ISSN
1932-5150
Issue
2
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
Volume
21
Title
Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design
Publication type
Journal article
Embargo date
2022-04-07
Collections
Articles
Version history
Version
Item
Date
Summary
3
20.500.12860/40250.3
*
2022-08-30T09:14:15Z
validation by library/open access desk
2
20.500.12860/40250.2
2022-08-17T08:36:25Z
validation by imec author
1
20.500.12860/40250
2022-08-12T02:39:07Z
*Selected version
Search imec Publications Repository
This collection
Browse
All of imec Publications Repository
Collections
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
This collection
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
My account
login