Browsing by author "Gillijns, Werner"
Now showing items 1-20 of 33
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28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography
Kim, Il Hwan; Kim, Insung; Park, Changmin; Lee, Jsiun; Ryu, Koungmin; De Schepper, P.; Doise, J.; Kocsis, M.; De Simone, Danilo; Kljucar, Luka; Das, Poulomi; Blanc, Romuald; Beral, Christophe; Severi, Joren; Vandenbroeck, Nadia; Foubert, Philippe; Charley, Anne-Laure; Oak, Apoorva; Xu, Dongbo; Gillijns, Werner; Mitard, Jerome; Tokei, Zsolt; van der Veen, Marleen; Heylen, Nancy; Teugels, Lieve; Le, Quoc Toan; Schleicher, Filip; Leray, Philippe; Ronse, Kurt (2021) -
Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling
Wei, Chih-, I; Kang, Seulki; Das, Sayantan; Oya, Masahiro; Okamoto, Yosuke; Maruyama, Kotaro; Fenger, Germain; Latypov, Azat; Kusnadi, Ir; Khaira, Gurdaman; Yamazaki, Yuichiro; Gillijns, Werner; Halder, Sandip; Lorusso, Gian (2023) -
Asymmetric optical second-harmonic generation from chiral G-shaped gold nanostructures
Valev, Ventsislav; Silhanek, Alejandro; Verellen, Niels; Gillijns, Werner; Van Dorpe, Pol; Aktsipetrov, O.A.; Vandenbosch, Guy; Moshchalkov, Victor; Verbiest, Thierry (2010) -
Better prediction on patterning failure mode with hotspot aware OPC modeling
Wei, Chih-I; Wu, Stewart; Deng, Yunfei; Khaira, Gurdaman; Kusnadi, I.; Fenger, G.; Kang, S.; Okamoto, Y.; Maruyama, K.; Yamaszaki, Y.; Das, Sayantan; Halder, Sandip; Gillijns, Werner; Lorusso, Gian (2021) -
Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer
De Simone, Danilo; Lyons, Adam; Rio, David; Lee, Sook; Delorme, Maxence; Fumar-Pici, Anita; Kocsis, Michael; De Schepper, Peter; Greer, Michael; Wallow, THomas; Stowers, Jason K; Gillijns, Werner; Bekaert, Joost (2017) -
Concurrent design rule, OPC and process optimization in EUV lithography
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Lee, Jae Uk; Kim, Ryan Ryoung han (2020) -
Design and Mask Optimization Toward Low Dose EUV Exposure
Xu, Dongbo; Gillijns, Werner; Kim, Ryan Ryoung han (2022-05-26) -
Design and pitch scaling for affordable node transition and EUV insertion scenario
Kim, Ryan Ryoung han; Ryckaert, Julien; Raghavan, Praveen; Sherazi, Yasser; Debacker, Peter; Trivkovic, Darko; Gillijns, Werner; Tan, Ling Ee; Drissi, Youssef; Blanco, Victor; Bekaert, Joost; Mao, Ming; Lariviere, Stephane; McIntyre, Greg (2017) -
EUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nm
Tan, Ling Ee; Gillijns, Werner; Lee, Jae Uk; Xu, Dongbo; Van de Kerkhove, Jeroen; Philipsen, Vicky; Kim, Ryan Ryoung han (2022-05-26) -
EUV Single Patterning Exploration for Pitch 28 nm
Xu, Dongbo; Gillijns, Werner; Drissi, Youssef; Tan, Ling Ee; Oak, Apoorva; Kim, Ryan Ryoung han (2021-02-22) -
EUV single patterning for logic metal layers: achievement and challenge
Kim, Ryan Ryoung han; Gillijns, Werner; Drissi, Youssef; Trivkovic, Darko; Blanco, Victor; Lariviere, Stephane; De Ruyter, Rudi; Dehan, Morin; McIntyre, Greg; Tan, Ling Ee (2017) -
Exploration of Alternative Mask for 0.33NA EUV Single Patterning at Pitch 28nm
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Philipsen, Vicky; Kim, Ryan Ryoung han (2021-10-12) -
Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Philipsen, Vicky; Kim, Ryan Ryoung han (2022) -
Exploring alternative EUV mask absorber for iN5 self-aligned block and contact layers
Sejpal, Rajiv; Philipsen, Vicky; Armeanu, Ana; Wei, Chi-I; Gillijns, Werner; Lafferty, Neal; Fenger, Germain; Hendrickx, Eric (2019) -
Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Rio, David; Delorme, Max; Philipsen, Vicky; Kim, Ryan Ryoung han (2022-11-25) -
Imaging challenges in 20nm and 14nm logic nodes: hot spots performance in Metal1 layer
Timoshkov, Vadim; Rio, David; Liu, H.; Gillijns, Werner; Wang, Jing; Wong, Patrick; Van Den Heuvel, Dieter; Wiaux, Vincent; Nikolsky, Peter; Finders, Jo (2013) -
IMEC N7, N5 and beyond: DTCO, STCO and EUV insertion strategy to maintain affordable scaling trend
Kim, Ryan Ryoung han; Sherazi, Yasser; Debacker, Peter; Raghavan, Praveen; Ryckaert, Julien; Mallik, Arindam; Verkest, Diederik; Lee, Jae Uk; Gillijns, Werner; Tan, Ling Ee; Blanco, Victor; Ronse, Kurt; McIntyre, Greg (2018) -
Impact of a SADP flow on the design and process for N10/N7 layers
Gillijns, Werner; Sherazi, Yasser; Trivkovic, Darko; Chava, Bharani; Vandewalle, B.; Gerousis, V.; Raghavan, Praveen; Ryckaert, Julien; Mercha, Abdelkarim; Verkest, Diederik; McIntyre, Greg; Ronse, Kurt (2015) -
Impact of mask corner rounding on pitch 40 nm contact hole variability
van Look, Lieve; Gillijns, Werner; Gallagher, Emily (2021) -
Improving OPC Model Accuracy of Dry Resist for Low k1 EUV Patterning
Xu, Dongbo; Gillijns, Werner; Wu, Stewart; Jambaldinni, Shruti; Kam, Benjamin; De Silva, Anuja; Fenger, Germain (2024)