EISBN
978-1-5106-4978-1
ISBN
978-1-5106-4977-4
ISSN
0277-786X
Conference
Conference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference
Journal
Proceedings of SPIE
Volume
12051
Title
EUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nm
Publication type
Proceedings paper