Browsing by author "Van de Kerkhove, Jeroen"
Now showing items 1-20 of 21
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300 mm wafer development for pattern collapse evaluations
Xu, XiuMei; Tao, Zheng; Saib, Mohamed; Sebaai, Farid; Van de Kerkhove, Jeroen; Vrancken, Nandi; Vereecke, Guy; Holsteyns, Frank (2018) -
Alignment and averaging of scanning electron microscope image contours for optical proximity correction modeling purposes
De Bisschop, Peter; Van de Kerkhove, Jeroen (2010) -
Calibration of physical resist models: methods, usability, and predictive power
Klostermann, U.; Mülders, T.; Ponomarenco, D.; Schmöller, T.; Van de Kerkhove, Jeroen; De Bisschop, Peter (2009) -
Calibration of physical resist models: methods, usability, and predictive power
Klostermann, Ulrich; Mülders, Thomas; Ponomarenco, Denis; Schmoeller, Thomas; Van de Kerkhove, Jeroen; De Bisschop, Peter (2009) -
Contour-quality assessment for OPC model calibration
Filitchkin, Paul; Do, Thuy; Kusnadi, Ir; Sturtevant, John; De Bisschop, Peter; Van de Kerkhove, Jeroen (2009) -
EUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nm
Tan, Ling Ee; Gillijns, Werner; Lee, Jae Uk; Xu, Dongbo; Van de Kerkhove, Jeroen; Philipsen, Vicky; Kim, Ryan Ryoung han (2022-05-26) -
Experimental proximity matching of ArF scanners
Bekaert, Joost; Van Look, Lieve; De Bisschop, Peter; Van de Kerkhove, Jeroen; Vandenberghe, Geert; Schreel, K.; Menger, J.; Schiffelers, G.; Knols, E.; van der Laan, H.; Willekers, R. (2008) -
High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithography
Hibino, Daisuke; Shindo, Hiroyuki; Abe, Yuuichi; Hojyo, Yutaka; Fenger, Germain; Do, Thuy; Kusnadi, Ir; Sturtevant, John L.; De Bisschop, Peter; Van de Kerkhove, Jeroen (2010) -
High-accuracy optical proximity correction modeling using advanced critical dimension scanning electron microscope-based contours in next-generation lithography
Hibino, Daisuke; Shindo, Hiroyuki; Abe, Yuichi; Hojyo, Yutaka; Fenger, Germain; Do, Thuy; Kusnadi, Ir; Sturtevant, John L.; Van de Kerkhove, Jeroen; De Bisschop, Peter (2011-02) -
High-precision contouring from SEM image in 32-nm lithography and beyond
Shindo, Hiroyuki; Sugiyama, Akiyuki; Komuro, Hitoshi; Hojyo, Yutaka; Matsuoka, Ryoichi; Sturtevant, John; Do, Thuy; Kusnadi, Ir; Fenger, Germain; De Bisschop, Peter; Van de Kerkhove, Jeroen (2009) -
Impact of stochastic effects on EUV printability limits
De Bisschop, Peter; Van de Kerkhove, Jeroen; Mailfert, Julien; Vaglio Pret, Alessandro; Biafore, John (2014) -
Investigation of litho1-litho2 proximity differences for a LPLE double patterning process
Wong, Patrick; De Bisschop, Peter; Robertson, Stewart; Vandenbroeck, Nadia; Biafore, John; Wiaux, Vincent; Van de Kerkhove, Jeroen (2011) -
Litho 1-litho 2 proximity differences for s LELE and LPLE double patterning processes
Wong, Patrick; De Bisschop, Peter; Vandenbroeck, Nadia; Wiaux, Vincent; Van de Kerkhove, Jeroen; Robertson, Stewart; Biafore, John (2012) -
Measurement technology to quantify 2D pattern shape in sub-2xnm advanced lithography
Fuchimoto, Daisuke; Sakai, H.; Shindo, H.; Izawa, M.; Sugahara, H.; Van de Kerkhove, Jeroen; De Bisschop, Peter (2013) -
Metal1 patterning study for randon-logic applications with 193i, using calibrated OPC for litho and etch
Mailfert, Julien; Van de Kerkhove, Jeroen; De Bisschop, Peter; De Meyer, Kristin (2014) -
Model calibration and validation for pre-production EUVL
Lorusso, Gian; Van de Kerkhove, Jeroen; De Bisschop, Peter; Hendrickx, Eric; Jiang, J.; Rio, David; Liu, W.; Liu, H. (2012) -
OPC resist model separability validation after SMO source change
Gillijns, Werner; Van de Kerkhove, Jeroen; Trivkovic, Darko; De Bisschop, Peter; Rio, David; Hsu, Stephen; Feng, Mu; Zang, Qiang; Liu, Hua-Yu (2013) -
SRAM cell architecture in 20nm and beyond: bulk planar versus bulk finFET
Dobrovolny, Petr; De Bisschop, Peter; Miranda Corbalan, Miguel; Zuber, Paul; Cosemans, Stefan; Mallik, Arindam; Van de Kerkhove, Jeroen (2012) -
Staggered pillar patterning using 0.33NA EUV lithography
De Simone, Danilo; Blanc, Romuald; Van de Kerkhove, Jeroen; Tamaddon, Amir-Hossein; Fallica, Roberto; Van Look, Lieve; Rassoul, Nouredine; Lazzarino, Frederic; Vandenbroeck, Nadia; Vanelderen, Pieter; Lorusso, Gian; Van Roey, Frieda; Charley, Anne-Laure; Vandenberghe, Geert; Ronse, Kurt; Lee, Kilyoung; Lee, Junghyung; Park, Sarohan; Lim, Chang-Moon; Park, Chan-Ha (2019) -
Tool-to-tool optical proximity effect matching
Van Look, Lieve; Bekaert, Joost; De Bisschop, Peter; Van de Kerkhove, Jeroen; Vandenberghe, Geert; Schreel, Koen; Menger, Jasper; Schiffelers, Guido; Knols, Edwin; Willekers, Rob (2008)