Publication:
EUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nm
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Acq. date: 2026-02-27
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814 since deposited on 2022-09-19
60last month
31last week
Acq. date: 2026-02-27
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1538 since deposited on 2022-09-19
Acq. date: 2026-02-27
Citations