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EUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nm

dc.contributor.authorTan, Ling Ee
dc.contributor.authorGillijns, Werner
dc.contributor.authorLee, Jae Uk
dc.contributor.authorXu, Dongbo
dc.contributor.authorVan de Kerkhove, Jeroen
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorKim, Ryan Ryoung han
dc.date.accessioned2022-09-29T15:05:47Z
dc.date.available2022-09-19T02:51:15Z
dc.date.available2022-09-26T09:29:16Z
dc.date.available2022-09-29T15:05:47Z
dc.date.issued2022-05-26
dc.identifier.isbn978-1-5106-4977-4
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000850450900022
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40459.3
dc.sourceWOS
dc.titleEUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nm
dc.typeProceedings paper
dc.contributor.imecauthorTan, Ling Ee
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorLee, Jae Uk
dc.contributor.imecauthorXu, Dongbo
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidimecTan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecLee, Jae Uk::0000-0002-9434-5055
dc.contributor.orcidimecXu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecVan de Kerkhove, Jeroen::0009-0005-4824-0411
dc.identifier.doi10.1117/12.2614000
dc.identifier.eisbn978-1-5106-4978-1
dc.source.numberofpages18
dc.source.peerreviewyes
dc.source.beginpage120510P
dc.source.conferenceConference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference
dc.source.conferencedateAPR 24-MAY 27, 2022
dc.source.conferencelocationSan Jose, California, United States
dc.source.journalProceedings of SPIE
dc.source.volume12051
imec.availabilityPublished - open access


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VersionItemDateSummary
320.500.12860/40459.3*2022-09-29T15:03:27Zvalidation by library/open access desk
220.500.12860/40459.22022-09-26T09:18:27Zvalidation by imec author
120.500.12860/404592022-09-19T02:51:15Z

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