Browsing by author "Tan, Ling Ee"
Now showing items 1-12 of 12
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Concurrent design rule, OPC and process optimization in EUV lithography
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Lee, Jae Uk; Kim, Ryan Ryoung han (2020) -
Design and pitch scaling for affordable node transition and EUV insertion scenario
Kim, Ryan Ryoung han; Ryckaert, Julien; Raghavan, Praveen; Sherazi, Yasser; Debacker, Peter; Trivkovic, Darko; Gillijns, Werner; Tan, Ling Ee; Drissi, Youssef; Blanco, Victor; Bekaert, Joost; Mao, Ming; Lariviere, Stephane; McIntyre, Greg (2017) -
EUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nm
Tan, Ling Ee; Gillijns, Werner; Lee, Jae Uk; Xu, Dongbo; Van de Kerkhove, Jeroen; Philipsen, Vicky; Kim, Ryan Ryoung han (2022-05-26) -
EUV Single Patterning Exploration for Pitch 28 nm
Xu, Dongbo; Gillijns, Werner; Drissi, Youssef; Tan, Ling Ee; Oak, Apoorva; Kim, Ryan Ryoung han (2021-02-22) -
EUV single patterning for logic metal layers: achievement and challenge
Kim, Ryan Ryoung han; Gillijns, Werner; Drissi, Youssef; Trivkovic, Darko; Blanco, Victor; Lariviere, Stephane; De Ruyter, Rudi; Dehan, Morin; McIntyre, Greg; Tan, Ling Ee (2017) -
Exploration of Alternative Mask for 0.33NA EUV Single Patterning at Pitch 28nm
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Philipsen, Vicky; Kim, Ryan Ryoung han (2021-10-12) -
Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Philipsen, Vicky; Kim, Ryan Ryoung han (2022) -
Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Rio, David; Delorme, Max; Philipsen, Vicky; Kim, Ryan Ryoung han (2022-11-25) -
IMEC N7, N5 and beyond: DTCO, STCO and EUV insertion strategy to maintain affordable scaling trend
Kim, Ryan Ryoung han; Sherazi, Yasser; Debacker, Peter; Raghavan, Praveen; Ryckaert, Julien; Mallik, Arindam; Verkest, Diederik; Lee, Jae Uk; Gillijns, Werner; Tan, Ling Ee; Blanco, Victor; Ronse, Kurt; McIntyre, Greg (2018) -
Investigation of Low-n Mask in 0.33NA EUV Single Patterning at Pitch 28nm Metal Design
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Philipsen, Vicky; Kim, Ryan Ryoung han (2022-05-26) -
Reticle enhancement techniques toward iN7 metal2
Gillijns, Werner; Tan, Ling Ee; Blanco, Victor; Trivkovic, Darko; Kim, Ryan Ryoung han; Gallagher, Emily; McIntyre, Greg (2017) -
Single exposure EUV patterning for BEOL metal layers on the imec iN7 platform
Blanco, Victor; Bekaert, Joost; Mao, Ming; Kutrzeba Kotowska, Bogumila; Lariviere, Stephane; Ciofi, Ivan; Baert, Rogier; Kim, Ryan Ryoung han; Gallagher, Emily; Hendrickx, Eric; Tan, Ling Ee; Gillijns, Werner; Trivkovic, Darko; Leray, Philippe; Halder, Sandip; Gallagher, Matt; Lazzarino, Frederic; Paolillo, Sara; Wan, Danny; Mallik, Arindam; Sherazi, Yasser; McIntyre, Greg; Dusa, Mircea; Rusu, Paul; Hollink, Thijs; Fliervoet, Timon; Wittebrood, Friso (2017)