Publication:

Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design

Date

2022
Journal article
https://doi.org/10.1117/1.JMM.21.2.024401
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Published version 5.55 MB

Author(s)

Xu, Dongbo  
;
Gillijns, Werner  
;
Tan, Ling Ee  
;
Philipsen, Vicky  
;
Kim, Ryan Ryoung han

Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

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1013 since deposited on 2022-08-12
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