Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design
Publication:
Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design
Copy permalink
Date
2022
Journal article
https://doi.org/10.1117/1.JMM.21.2.024401
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
Published version
5.55 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Xu, Dongbo
;
Gillijns, Werner
;
Tan, Ling Ee
;
Philipsen, Vicky
;
Kim, Ryan Ryoung han
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
Abstract
Description
Metrics
Downloads
793
since deposited on 2022-08-12
41
last month
11
last week
Acq. date: 2025-12-12
Views
1691
since deposited on 2022-08-12
1
last month
Acq. date: 2025-12-12
Citations
Metrics
Downloads
793
since deposited on 2022-08-12
41
last month
11
last week
Acq. date: 2025-12-12
Views
1691
since deposited on 2022-08-12
1
last month
Acq. date: 2025-12-12
Citations