Publication:

Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design

Date

2022
Journal article
https://doi.org/10.1117/1.JMM.21.2.024401
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dc.contributor.authorXu, Dongbo
dc.contributor.authorGillijns, Werner
dc.contributor.authorTan, Ling Ee
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.imecauthorXu, Dongbo
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorTan, Ling Ee
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidimecXu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecTan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2022-08-30T09:16:14Z
dc.date.available2022-08-12T02:39:07Z
dc.date.available2022-08-17T08:44:19Z
dc.date.available2022-08-30T09:16:14Z
dc.date.embargo2022-04-07
dc.date.issued2022
dc.identifier.doi10.1117/1.JMM.21.2.024401
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40250
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpage024401
dc.source.issue2
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages15
dc.source.volume21
dc.subject.keywordsEUV
dc.subject.keywordsextreme ultraviolet single patterning; mask absorber; source mask optimization; logic; pitch 28 nm
dc.title

Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design

dc.typeJournal article
dspace.entity.typePublication
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