dc.contributor.author | Decoster, Stefan | |
dc.contributor.author | Kundu, Souvik | |
dc.contributor.author | Lazzarino, Frederic | |
dc.contributor.author | Lariviere, Stephane | |
dc.contributor.author | O'Toole, Martin | |
dc.contributor.author | Murdoch, Gayle | |
dc.contributor.author | van der Veen, Marleen | |
dc.contributor.author | Heylen, Nancy | |
dc.contributor.author | Le, Quoc Toan | |
dc.date.accessioned | 2022-12-15T15:18:19Z | |
dc.date.available | 2022-09-08T02:38:39Z | |
dc.date.available | 2022-10-10T10:22:30Z | |
dc.date.available | 2022-12-15T15:18:19Z | |
dc.date.issued | 2022 | |
dc.identifier.isbn | 978-1-5106-4987-3 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000844514700003 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40370.3 | |
dc.source | WOS | |
dc.title | Patterning of Ru metal lines at 18 nm pitch | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Decoster, Stefan | |
dc.contributor.imecauthor | Kundu, Souvik | |
dc.contributor.imecauthor | Lazzarino, Frederic | |
dc.contributor.imecauthor | Lariviere, Stephane | |
dc.contributor.imecauthor | O'Toole, Martin | |
dc.contributor.imecauthor | Murdoch, Gayle | |
dc.contributor.imecauthor | van der Veen, Marleen | |
dc.contributor.imecauthor | Heylen, Nancy | |
dc.contributor.imecauthor | Le, Quoc Toan | |
dc.contributor.orcidimec | Decoster, Stefan::0000-0003-1162-9288 | |
dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
dc.contributor.orcidimec | van der Veen, Marleen::0000-0002-9402-8922 | |
dc.contributor.orcidimec | Le, Quoc Toan::0000-0002-0206-6279 | |
dc.contributor.orcidimec | Kundu, Souvik::0000-0001-5815-8765 | |
dc.contributor.orcidimec | Lariviere, Stephane::0009-0004-9271-2191 | |
dc.contributor.orcidimec | Murdoch, Gayle::0000-0002-6833-220X | |
dc.contributor.orcidimec | Heylen, Nancy::0009-0008-0490-0993 | |
dc.identifier.doi | 10.1117/12.2614267 | |
dc.identifier.eisbn | 978-1-5106-4988-0 | |
dc.source.numberofpages | 10 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1205604 | |
dc.source.conference | Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference | |
dc.source.conferencedate | APR 24-MAY 27, 2020-2022 | |
dc.source.conferencelocation | San Jose, California, USA | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12056 | |
imec.availability | Published - open access | |