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Unbiased Roughness Measurements from Low Signal-to-Noise Ratio SEM Images

dc.contributor.authorMack, Chris A.
dc.contributor.authorSeveri, Joren
dc.contributor.authorZidan, Mohamed
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorLorusso, Gian
dc.date.accessioned2022-12-01T09:48:25Z
dc.date.available2022-09-08T02:38:59Z
dc.date.available2022-12-01T09:48:25Z
dc.date.issued2022
dc.identifier.isbn978-1-5106-4981-1
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000844549800019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40380.2
dc.sourceWOS
dc.titleUnbiased Roughness Measurements from Low Signal-to-Noise Ratio SEM Images
dc.typeProceedings paper
dc.contributor.imecauthorSeveri, Joren
dc.contributor.imecauthorZidan, Mohamed
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorLorusso, Gian
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.identifier.doi10.1117/12.2614454
dc.identifier.eisbn978-1-5106-4982-8
dc.source.numberofpages12
dc.source.peerreviewyes
dc.source.beginpage120530K
dc.source.conferenceConference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference
dc.source.conferencedateFEB 24-MAY 27, 2022
dc.source.conferencelocationSan Jose, CA, USA
dc.source.journalProceedings of SPIE
dc.source.volume12053
imec.availabilityPublished - imec


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220.500.12860/40380.2*2022-12-01T09:44:51Zvalidation by library/open access desk
120.500.12860/403802022-09-08T02:38:59Z

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