dc.contributor.author | Battisti, I | |
dc.contributor.author | Makles, K. M. | |
dc.contributor.author | Mucientes, M. S. J. | |
dc.contributor.author | Guo, Y. | |
dc.contributor.author | Simons, E. | |
dc.contributor.author | Bogdanowicz, Janusz | |
dc.contributor.author | Moussa, Alain | |
dc.contributor.author | Blanco, Victor | |
dc.contributor.author | Yasin, Farrukh | |
dc.contributor.author | Crotti, Davide | |
dc.contributor.author | Charley, Anne-Laure | |
dc.contributor.author | Leray, Philippe | |
dc.contributor.author | van Reijzen, M. E. | |
dc.contributor.author | Bozdog, C. | |
dc.contributor.author | Sadeghian, H. | |
dc.date.accessioned | 2022-09-08T15:09:56Z | |
dc.date.available | 2022-09-08T02:39:00Z | |
dc.date.available | 2022-09-08T15:09:56Z | |
dc.date.issued | 2022 | |
dc.identifier.isbn | 978-1-5106-4981-1 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000844549800034 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40381.2 | |
dc.source | WOS | |
dc.title | Subsurface Scanning Probe Metrology for Overlay through Opaque Layers | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Bogdanowicz, Janusz | |
dc.contributor.imecauthor | Moussa, Alain | |
dc.contributor.imecauthor | Blanco, Victor | |
dc.contributor.imecauthor | Yasin, Farrukh | |
dc.contributor.imecauthor | Crotti, Davide | |
dc.contributor.imecauthor | Charley, Anne-Laure | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.orcidimec | Bogdanowicz, Janusz::0000-0002-7503-8922 | |
dc.contributor.orcidimec | Blanco, Victor::0000-0003-4308-0381 | |
dc.contributor.orcidimec | Yasin, Farrukh::0000-0002-7295-0254 | |
dc.contributor.orcidimec | Charley, Anne-Laure::0000-0003-4745-0167 | |
dc.contributor.orcidimec | Leray, Philippe::0000-0002-1086-270X | |
dc.identifier.doi | 10.1117/12.2616093 | |
dc.identifier.eisbn | 978-1-5106-4982-8 | |
dc.source.numberofpages | 10 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1205310 | |
dc.source.conference | Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference | |
dc.source.conferencedate | FEB 24-MAY 27, 2022 | |
dc.source.conferencelocation | San Jose | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12053 | |
imec.availability | Published - imec | |