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EUV lithographic process enablement with novel litho track hardware

dc.contributor.authorSantos, Andreia
dc.contributor.authorKosma, Vasiliki
dc.contributor.authorVandereyken, Jelle
dc.contributor.authorMarhfour, H.
dc.contributor.authorTanaka, Y.
dc.contributor.authorHarumoto, M.
dc.contributor.authorAsai, M.
dc.contributor.authorStokes, H.
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorFoubert, Philippe
dc.contributor.authorDe Simone, Danilo
dc.date.accessioned2022-09-08T15:24:27Z
dc.date.available2022-09-08T02:39:17Z
dc.date.available2022-09-08T15:24:27Z
dc.date.issued2021
dc.identifier.isbn978-1-5106-4057-3
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000844537900014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40388.2
dc.sourceWOS
dc.titleEUV lithographic process enablement with novel litho track hardware
dc.typeProceedings paper
dc.contributor.imecauthorKosma, Vasiliki
dc.contributor.imecauthorVandereyken, Jelle
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.identifier.doi10.1117/12.2584515
dc.identifier.eisbn978-1-5106-4058-0
dc.source.numberofpages8
dc.source.peerreviewyes
dc.source.beginpage116120M
dc.source.conferenceConference on Advances in Patterning Materials and Processes XXXVIII Part of SPIE Advanced Lithography Conference
dc.source.conferencedateFEB 22-26, 2021
dc.source.conferencelocationVirtual
dc.source.journalProceedings of SPIE
dc.source.volume11612
imec.availabilityPublished - imec


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220.500.12860/40388.2*2022-09-08T15:19:19Zvalidation by library/open access desk
120.500.12860/403882022-09-08T02:39:17Z

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