dc.contributor.author | Shirotori, Akihide | |
dc.contributor.author | Hoshino, Manabu | |
dc.contributor.author | Rathore, Ashish | |
dc.contributor.author | Fu, Yeh Sin | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Matsumoto, Hirokazu | |
dc.date.accessioned | 2023-06-15T13:32:46Z | |
dc.date.available | 2022-09-10T02:52:04Z | |
dc.date.available | 2023-06-15T13:32:46Z | |
dc.date.issued | 2022 | |
dc.identifier.isbn | 978-1-5106-4985-9 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000844546500013 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40416.2 | |
dc.source | WOS | |
dc.title | Improved resolution with main chain scission resists for EUV lithography | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Rathore, Ashish | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.identifier.doi | 10.1117/12.2613445 | |
dc.identifier.eisbn | 978-1-5106-4986-6 | |
dc.source.numberofpages | 10 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 120550E | |
dc.source.conference | Conference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference | |
dc.source.conferencedate | APR 24-MAY 27, 2022 | |
dc.source.conferencelocation | San Jose | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12055 | |
imec.availability | Published - imec | |