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Logic via printability enhancement using restricted via placement and exhaustive SRAF placement on a staggered grid
dc.contributor.author | Woltgens, Pieter | |
dc.contributor.author | Colina, Alberto | |
dc.contributor.author | Rio, David | |
dc.contributor.author | Delorme, Max | |
dc.contributor.author | Kovalevich, Tatiana | |
dc.contributor.author | Thiam, Arame | |
dc.contributor.author | Van Roey, Frieda | |
dc.contributor.author | Zografos, Odysseas | |
dc.date.accessioned | 2022-09-26T10:02:08Z | |
dc.date.available | 2022-09-19T02:51:17Z | |
dc.date.available | 2022-09-26T10:02:08Z | |
dc.date.issued | 2022-05-26 | |
dc.identifier.isbn | 978-1-5106-4977-4 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000850450900016 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40464.2 | |
dc.source | WOS | |
dc.title | Logic via printability enhancement using restricted via placement and exhaustive SRAF placement on a staggered grid | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Delorme, Max | |
dc.contributor.imecauthor | Kovalevich, Tatiana | |
dc.contributor.imecauthor | Thiam, Arame | |
dc.contributor.imecauthor | Van Roey, Frieda | |
dc.contributor.imecauthor | Zografos, Odysseas | |
dc.contributor.orcidimec | Zografos, Odysseas::0000-0002-9998-8009 | |
dc.identifier.doi | 10.1117/12.2614260 | |
dc.identifier.eisbn | 978-1-5106-4978-1 | |
dc.source.numberofpages | 6 | |
dc.source.peerreview | yes | |
dc.subject.discipline | Electrical & electronic engineering | |
dc.source.conference | Conference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference | |
dc.source.conferencedate | APR 24-MAY 27, 2022 | |
dc.source.conferencelocation | San Jose, California, United States | |
dc.source.journal | SPIE Proceedings Vol. 12051: Optical and EUV Nanolithography XXXV | |
dc.source.volume | 12051 | |
imec.availability | Under review |