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Combining TCAD and advanced metrology techniques to support device integration towards N3

dc.contributor.authorEyben, P.
dc.contributor.authorDe Keersgieter, A.
dc.contributor.authorCelano, U.
dc.contributor.authorWouters, L.
dc.contributor.authorChiarella, T.
dc.contributor.authorRitzenthaler, R.
dc.contributor.authorMertens, H.
dc.contributor.authorRichard, O.
dc.contributor.authorParedis, K.
dc.contributor.authorMatagne, P.
dc.contributor.authorMitard, J.
dc.contributor.authorHoriguchi, N.
dc.contributor.authorGoux, L.
dc.date.accessioned2022-10-25T02:54:16Z
dc.date.available2022-10-25T02:54:16Z
dc.date.issued2021
dc.identifier.otherWOS:000865945700026
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40612
dc.sourceWOS
dc.titleCombining TCAD and advanced metrology techniques to support device integration towards N3
dc.typeProceedings paper
dc.contributor.imecauthorEyben, P.
dc.contributor.imecauthorDe Keersgieter, A.
dc.contributor.imecauthorCelano, U.
dc.contributor.imecauthorWouters, L.
dc.contributor.imecauthorChiarella, T.
dc.contributor.imecauthorRitzenthaler, R.
dc.contributor.imecauthorMertens, H.
dc.contributor.imecauthorRichard, O.
dc.contributor.imecauthorParedis, K.
dc.contributor.imecauthorMatagne, P.
dc.contributor.imecauthorMitard, J.
dc.contributor.imecauthorHoriguchi, N.
dc.contributor.imecauthorGoux, L.
dc.identifier.eisbn978-4-86348-779-6
dc.source.numberofpages4
dc.source.peerreviewyes
dc.source.beginpage84
dc.source.endpage87
dc.source.conference20th International Workshop on Junction Technology (IWJT)
dc.source.conferencedateJUN 10-11, 2021
imec.availabilityUnder review


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220.500.12860/40612.22022-11-17T14:29:05Zvalidation by library/open access desk
120.500.12860/40612*2022-10-25T02:54:16Z

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