Publication:

Characterisation of plasma etch releted residues formed on top of ECD Cu films

Date

2000

Proceedings Paper

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Files

4055.pdf 362.64 KB

Author(s)

Baklanov, Mikhaïl

;

Conard, Thierry

;

Lanckmans, Filip

;

Vanhaelemeersch, Serge

;

;

Statistics

1911 since deposited on 2021-10-14

Acq. date: 2026-09-20