Show simple item record

Characterisation of plasma etch releted residues formed on top of ECD Cu films

dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorConard, Thierry
dc.contributor.authorLanckmans, Filip
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorHolmes, D.
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T12:40:07Z
dc.date.available2021-10-14T12:40:07Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4087
dc.sourceIIOimport
dc.titleCharacterisation of plasma etch releted residues formed on top of ECD Cu films
dc.typeProceedings paper
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage615
dc.source.endpage619
dc.source.conferenceAdvanced Metallization Conference 1999 - AMC 1999
dc.source.conferencedate28/09/1999
dc.source.conferencelocationOrlando, FL USA
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
4055.pdf
Size:
362.6Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record