dc.contributor.author | van Haren, Richard J. F. | |
dc.contributor.author | Steinert, Steffen | |
dc.contributor.author | Mouraille, Orion | |
dc.contributor.author | Kasperkiewicz, Ewa | |
dc.contributor.author | Hermans, Jan | |
dc.contributor.author | Hasan, Mahmudul | |
dc.contributor.author | van Dijk, Leon | |
dc.contributor.author | Beyer, Dirk | |
dc.date.accessioned | 2023-04-28T10:19:40Z | |
dc.date.available | 2023-02-15T03:23:35Z | |
dc.date.available | 2023-02-16T11:38:41Z | |
dc.date.available | 2023-04-28T10:19:40Z | |
dc.date.issued | 2022 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000905312400019 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41097.3 | |
dc.source | WOS | |
dc.title | Direct correlation between mask registration and on-wafer measurements for individual logic device features | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Hermans, Jan | |
dc.contributor.imecauthor | Hasan, Mahmudul | |
dc.contributor.orcidimec | Hermans, Jan::0000-0003-1249-8902 | |
dc.identifier.doi | 10.1117/12.2641618 | |
dc.identifier.eisbn | 978-1-5106-5642-0 | |
dc.source.numberofpages | 12 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 122930L | |
dc.source.conference | Photomask Technology Conference | |
dc.source.conferencedate | SEP 26-29, 2022 | |
dc.source.conferencelocation | Monterey | |
dc.source.journal | Proceedings of SPIE | |
dc.source.volume | 12293 | |
imec.availability | Published - imec | |