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Advanced solutions for copper and low k technology

dc.contributor.authorBeyer, Gerald
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorDe Roest, David
dc.contributor.authorDonaton, R.
dc.contributor.authorGrillaert, Joost
dc.contributor.authorLanckmans, Filip
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorMaex, Karen
dc.contributor.authorRichard, Emmanuel
dc.contributor.authorStruyf, Herbert
dc.contributor.authorStucchi, Michele
dc.contributor.authorTokei, Zsolt
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorVervoort, Iwan
dc.date.accessioned2021-10-14T12:40:54Z
dc.date.available2021-10-14T12:40:54Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4117
dc.sourceIIOimport
dc.titleAdvanced solutions for copper and low k technology
dc.typeOral presentation
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorDe Roest, David
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.contributor.orcidimecStruyf, Herbert::0000-0002-6782-5424
dc.source.peerreviewno
dc.source.conferenceSemicon Europe; 2000; München, Germany.
dc.source.conferencelocation
imec.availabilityPublished - imec


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