Show simple item record

Rapid thermal anealing of electro chemically plated Cu films

dc.contributor.authorBeyer, Gerald
dc.contributor.authorKitabijan, P.
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorProost, Joris
dc.contributor.authorBender, Hugo
dc.contributor.authorRichard, Emmanuel
dc.contributor.authorVervoort, Iwan
dc.contributor.authorHey, P.
dc.contributor.authorZhang, P.
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T12:40:58Z
dc.date.available2021-10-14T12:40:58Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4119
dc.sourceIIOimport
dc.titleRapid thermal anealing of electro chemically plated Cu films
dc.typeProceedings paper
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage167
dc.source.endpage171
dc.source.conferenceAdvanced Metallization Conference 1999 - AMC 1999
dc.source.conferencedate28/09/1999
dc.source.conferencelocationOrlando, FL USA
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
4089.pdf
Size:
462.1Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record