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Image contrast metrology for EUV lithography
dc.contributor.author | Brunner, Timothy A. | |
dc.contributor.author | Truffert, Vincent | |
dc.contributor.author | Ausschnitt, Christopher | |
dc.contributor.author | Kissoon, Nicola N. | |
dc.contributor.author | Duriau, Edouard | |
dc.contributor.author | Jonckers, Tom | |
dc.contributor.author | van Look, Lieve | |
dc.contributor.author | Franke, Joern-Holger | |
dc.date.accessioned | 2023-03-22T03:40:56Z | |
dc.date.available | 2023-03-22T03:40:56Z | |
dc.date.issued | 2022 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000944102600009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41327 | |
dc.source | WOS | |
dc.title | Image contrast metrology for EUV lithography | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Truffert, Vincent | |
dc.contributor.imecauthor | Ausschnitt, Christopher | |
dc.contributor.imecauthor | van Look, Lieve | |
dc.contributor.imecauthor | Franke, Joern-Holger | |
dc.contributor.orcidimec | Truffert, Vincent::0000-0001-7851-830X | |
dc.contributor.orcidimec | Franke, Joern-Holger::0000-0002-3571-1633 | |
dc.identifier.doi | 10.1117/12.2640647 | |
dc.identifier.eisbn | 978-1-5106-5640-6 | |
dc.source.numberofpages | 12 | |
dc.source.peerreview | yes | |
dc.source.conference | International Conference on Extreme Ultraviolet Lithography | |
dc.source.conferencedate | SEP 26-29, 2022 | |
dc.source.conferencelocation | Monterey | |
dc.source.volume | 12292 | |
imec.availability | Under review |
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