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Image contrast metrology for EUV lithography
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Authors
Brunner, Timothy A.
;
Truffert, Vincent
;
Ausschnitt, Kit
;
Kissoon, Nicola N.
;
Duriau, Edouard
;
Jonckers, Tom
;
van Look, Lieve
;
Franke, Joern-Holger
DOI
10.1117/12.2640647
EISBN
978-1-5106-5640-6
ISSN
0277-786X
Conference
International Conference on Extreme UltraViolet Lithography
Journal
Proceedings of SPIE
Volume
12292
Title
Image contrast metrology for EUV lithography
Publication type
Proceedings paper
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Conference contributions
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Version
Item
Date
Summary
3
20.500.12860/41327.3
*
2023-06-15T13:25:56Z
validation by library/open access desk
2
20.500.12860/41327.2
2023-03-23T14:54:29Z
validation by imec author
1
20.500.12860/41327
2023-03-22T03:40:56Z
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