Browsing by author "Van Look, Lieve"
Now showing items 1-20 of 62
-
A new concept to qualify pattern shift on EUV scanners
Van den berg, Pim; Van Look, Lieve; Van Swaaij, Gijs; Van Rhee, Tasja; Schiffelers, Guido; Gielis, Joost (2019) -
A practical alternating PSM modeling and OPC approach to deal with 3D mask effects for the 65nm node and beyond
Drapeau, Martin; van Adrichem, Paul.J.M.; Van Look, Lieve; Kasprowicz, Bryan S. (2005) -
Accurate mapping of dose variations on EUV scanners using dose-to-clear exposures and optical ellipsometry
Nair, Vineet Vijayakrishnan; Van Look, Lieve; Aubert, Remko; Hendrickx, Eric (2020) -
Alternative EUV mask technology for mask 3D effect compensation
Van Look, Lieve; Philipsen, Vicky; Hendrickx, Eric; Vandenberghe, Geert; Knops, Roel; Davydova, Natalia; Wittebrood, Friso; De Kruif, Robert; Van Oosten, Anton; Fliervoet, Timon; Van Schoot, Jan; Neumann, Jens Timo (2014) -
Alternative EUV mask technology to compensate for mask 3D effects
Van Look, Lieve; Philipsen, Vicky; Hendrickx, Eric; Vandenberghe, Geert; Davydova, Natalia; Wittebrood, Friso; De Kruif, Robert; Van Oosten, Anton; Miyazaki, Junji; Fliervoet, Timon; Van Schoot, Jan; Neumann, Jens Timo (2015) -
Capture probability of assembly defects in 14 nm half-pitch line/space DSA patterns
Pathangi Sriraman, Hari; Chan, BT; Van Look, Lieve; Vandenbroeck, Nadia; Van Den Heuvel, Dieter; Cross, Andrew; Hong, Sung Eun; Nafus, Kathleen; D'Urzo, Lucia; Gronheid, Roel (2015) -
Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures
Bekaert, Joost; Gallagher, Emily; Jonckheere, Rik; Van Look, Lieve; Aubert, Remko; Klein, Alexander; Yegen, Gokay; Broman, Par; Nair, Vineet Vijayakrishnan; Timmermans, Marina; Pollentier, Ivan; Hendrickx, Eric (2021-05-27) -
Characterization and control of dynamic lens heating effects under high-volume manufacturing conditions
Bekaert, Joost; Van Look, Lieve; Vandenberghe, Geert; Van Adrichem, Paul; Maslow, Mark J.; Gemmink, Jan-Willem; Cao, Hua; Hunsche, Stefan; Neumann, Jens Timo; Wolf, Alexander (2011) -
CNT pellicles: Imaging results of the first full-field EUV exposures
Bekaert, Joost; Gallagher, Emily; Jonckheere, Rik; Van Look, Lieve; Aubert, Remko; Klein, Alexander; Yegen, Gokay; Broman, Par; Felix, Nelson M.; Lio, Anna; Nair, Vineet Vijayakrishnan; Timmermans, Marina; Pollentier, Ivan; Hendrickx, Eric (2021) -
Combined illumination sources for hyper-NA contact hole printing
Bekaert, Joost; Truffert, Vincent; Willems, Patrick; Van Look, Lieve; Op de Beeck, Maaike; Hendrickx, Eric; Vandenberghe, Geert (2007) -
Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm node
Bekaert, Joost; Van Look, Lieve; Truffert, Vincent; Lazzarino, Frederic; Vandenberghe, Geert; Reybrouck, Mario; Tarutani, Shinji (2010-12) -
Defect capture sensitivity in 14 nm half-pitch line/space DSA patterns
Pathangi Sriraman, Hari; Gronheid, Roel; Van Den Heuvel, Dieter; Rincon Delgadillo, Paulina; Chan, BT; Van Look, Lieve; Bayana, Hareen; Cao, Yi; Her, YoungJun; Lin, Guanyang; Parnell, Doni; Nafus, Kathleen; Somervell, Mark; Harukawa, Ryoto; Chikashi, Ito; Nagaswami, Venkat; D'Urzo, Lucia; Nealey, Paul (2014) -
Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow
Pathangi Sriraman, Hari; Chan, BT; Bayana, Hareen; Vandenbroeck, Nadia; Van Den Heuvel, Dieter; Van Look, Lieve; Rincon Delgadillo, Paulina; Cao, Yi; Kim, JiHoon; Lin, Guanyang; Parnell, Doni; Nafus, Kathleen; Harukawa, Ryota; Chikashi, Ito; Polli, Marco; D'Urzo, Lucia; Gronheid, Roel; Nealey, Paul (2015) -
Defect mitigation and root cause studies in imec's 14 nm half-pitch chemo-epitaxy DSA flow
Pathangi Sriraman, Hari; Chan, BT; Bayana, Hareen; Van Den Heuvel, Dieter; Van Look, Lieve; Rincon Delgadillo, Paulina; Cao, Yi; Kim, YiHoon; Lin, G.; Parnell, Doni; Nafus, Kathleen; Harukawa, Ryoto; Chikashi, Ito; Nagaswami, Venkat; D'Urzo, Lucia; Gronheid, Roel; Nealey, Paul (2015) -
Defect reduction and defect stability in imec's 14nm half pitch chemo-epitaxy DSA flow
Gronheid, Roel; Rincon Delgadillo, Paulina; Pathangi Sriraman, Hari; Van Den Heuvel, Dieter; Parnell, Doni; Chan, BT; Lee, Yu-tsung; Van Look, Lieve; Cao, Yi; Her, YoungJun; Lin, Guanyang; Harukawa, Ryoto; Nagaswami, Venkat; D'Urzo, Lucia; Somervell, Mark; Nealey, Paul (2014) -
Effect of laser bandwidth tuning on line/space and contact printing at 1.35NA
Van Look, Lieve; Bekaert, Joost; Vandenberghe, Geert; Lalovic, Ivan; Farrar, Nigel (2008) -
Enhanced vortex pinning by a composite antidot lattice in a superconducting Pb film
Silhanek, A.V.; Van Look, Lieve; Jonckheere, Rik; Zhu, B.Y.; Raedts, S.; Moshchalkov, V.V. (2005) -
EUVL is being inserted in HVM in 2019 : what are the mask related challenges remaining ?
Ronse, Kurt; Jonckheere, Rik; Gallagher, Emily; Philipsen, Vicky; Van Look, Lieve; Hendrickx, Eric; Kim, Ryan Ryoung han (2019) -
Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask
Kovalevich, Tatiana; Van Look, Lieve; Franke, Joern-Holger; Philipsen, Vicky (2023) -
Evaluation of local CD and placement distribution on EUV mask and its impact on wafer
Vaenkatesan, Vidya; Van Adrichem, Paul; Kooiman, Marleen; Kubis, Michael; Van Look, Lieve; Frommhold, Andreas; Gallagher, Emily; Nam, DS; Mulkens, Jan; Finders, Jo; Rispens, Gijsbert (2019)