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Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask
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Authors
Kovalevich, Tatiana
;
Van Look, Lieve
;
Franke, Joern-Holger
;
Philipsen, Vicky
DOI
10.1117/1.JMM.22.2.024401
ISSN
1932-5150
Issue
2
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
Volume
22
Title
Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask
Publication type
Journal article
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2
20.500.12860/42404.2
*
2024-03-11T15:16:42Z
validation by library/open access desk
1
20.500.12860/42404
2023-08-27T17:28:47Z
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