Notice

This item has not yet been validated by imec staff.

Notice

This is not the latest version of this item. The latest version can be found at: https://imec-publications.be/handle/20.500.12860/41333.3

Show simple item record

Extraction of Roughness Measurements from Thin Resists with Low Signal-to-Noise-Ratio (SNR) SEM Images by Applying Deep Learning Denoiser

dc.contributor.authorZidan, Mohamed
dc.contributor.authorDey, Bappaditya
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorSeveri, Joren
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorHalder, Sandip
dc.contributor.authorLeray, Philippe
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorLorusso, Gian Francesco
dc.date.accessioned2023-03-24T08:14:45Z
dc.date.available2023-03-22T03:41:00Z
dc.date.available2023-03-24T08:14:45Z
dc.date.issued2022
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000944102600017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41333.2
dc.sourceWOS
dc.titleExtraction of Roughness Measurements from Thin Resists with Low Signal-to-Noise-Ratio (SNR) SEM Images by Applying Deep Learning Denoiser
dc.typeProceedings paper
dc.contributor.imecauthorZidan, Mohamed
dc.contributor.imecauthorDey, Bappaditya
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorSeveri, Joren
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorLorusso, Gian Francesco
dc.contributor.orcidimecDey, Bappaditya::0000-0002-0886-137X
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.identifier.doi10.1117/12.2643315
dc.identifier.eisbn978-1-5106-5640-6
dc.source.numberofpages13
dc.source.peerreviewyes
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 26-29, 2022
dc.source.conferencelocationMonterey
dc.source.journalSPIE Photomask Technology + EUV Lithography 2022
dc.source.volume12292
imec.availabilityUnder review


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

    Show simple item record

    Version history

    VersionItemDateSummary
    320.500.12860/41333.32023-04-12T10:31:47Zvalidation by library/open access desk
    220.500.12860/41333.2*2023-03-24T08:12:59Zvalidation by imec author
    120.500.12860/413332023-03-22T03:41:00Z

    *Selected version