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Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing

dc.contributor.authorSah, Kaushik
dc.contributor.authorCross, Andrew
dc.contributor.authorDas, Sayantan
dc.contributor.authorFallica, Roberto
dc.contributor.authorLee, Jeonghoon
dc.contributor.authorKim, Ryoung-Han
dc.contributor.authorHalder, Sandip
dc.contributor.authorMaguire, Ethan
dc.contributor.authorArmeanu, Ana-Maria
dc.contributor.authorSears, Monica
dc.contributor.authorLafferty, Neal
dc.contributor.authorLiubich, Vlad
dc.contributor.authorWei, Chih-, I
dc.contributor.authorFenger, Germain
dc.date.accessioned2023-03-22T03:41:01Z
dc.date.available2023-03-22T03:41:01Z
dc.date.issued2022
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000944102600031
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41334
dc.sourceWOS
dc.titleSingle Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing
dc.typeProceedings paper
dc.contributor.imecauthorDas, Sayantan
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorLee, Jeonghoon
dc.contributor.imecauthorKim, Ryoung-Han
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecDas, Sayantan::0000-0002-3031-0726
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.identifier.doi10.1117/12.2645953
dc.identifier.eisbn978-1-5106-5640-6
dc.source.numberofpages3
dc.source.peerreviewyes
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 26-29, 2022
dc.source.conferencelocationMonterey
dc.source.volume12292
imec.availabilityUnder review


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220.500.12860/41334.22023-06-08T13:50:00Zvalidation by library/open access desk
120.500.12860/41334*2023-03-22T03:41:01Z

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