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Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry
dc.contributor.author | Dorney, Kevin | |
dc.contributor.author | Kissoon, Nicola | |
dc.contributor.author | Holzmeier, Fabian | |
dc.contributor.author | Witting Larsen, Esben | |
dc.contributor.author | Singh, Dhirendra | |
dc.contributor.author | Arvind, Shikhar | |
dc.contributor.author | Santra, Sayantani | |
dc.contributor.author | Fallica, Roberto | |
dc.contributor.author | Makhotkin, Igor | |
dc.contributor.author | Philipsen, Vicky | |
dc.contributor.author | De Gendt, Stefan | |
dc.contributor.author | Fleischmann, Claudia | |
dc.contributor.author | van der Heide, Paul | |
dc.contributor.author | Petersen, John | |
dc.date.accessioned | 2023-05-22T14:55:34Z | |
dc.date.available | 2023-05-22T14:55:34Z | |
dc.date.issued | 2023-04-28 | |
dc.identifier.issn | 1996-756X | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41605 | |
dc.title | Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Dorney, Kevin | |
dc.contributor.imecauthor | Kissoon, Nicola | |
dc.contributor.imecauthor | Holzmeier, Fabian | |
dc.contributor.imecauthor | Witting Larsen, Esben | |
dc.contributor.imecauthor | Singh, Dhirendra | |
dc.contributor.imecauthor | Arvind, Shikhar | |
dc.contributor.imecauthor | Santra, Sayantani | |
dc.contributor.imecauthor | Fallica, Roberto | |
dc.contributor.imecauthor | Makhotkin, Igor | |
dc.contributor.imecauthor | Philipsen, Vicky | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.imecauthor | Fleischmann, Claudia | |
dc.contributor.imecauthor | van der Heide, Paul | |
dc.contributor.imecauthor | Petersen, John | |
dc.contributor.orcidimec | Dorney, Kevin::0000-0003-2097-6994 | |
dc.contributor.orcidimec | Holzmeier, Fabian::0000-0001-8749-5330 | |
dc.contributor.orcidimec | Witting Larsen, Esben::0000-0002-6294-0896 | |
dc.contributor.orcidimec | Singh, Dhirendra::0000-0002-8855-0597 | |
dc.contributor.orcidimec | Fallica, Roberto::0000-0003-4523-9624 | |
dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.contributor.orcidimec | Fleischmann, Claudia::0000-0003-1531-6916 | |
dc.contributor.orcidimec | van der Heide, Paul::0000-0001-6292-0329 | |
dc.identifier.doi | http://dx.doi.org/10.1117/12.2658359 | |
dc.source.numberofpages | 10 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1249407-1 | |
dc.source.endpage | 1249407-10 | |
dc.source.conference | SPIE Advanced Lithography + Patterning | |
dc.source.conferencedate | 2023 | |
dc.source.conferencelocation | San Jose, California, United States | |
dc.source.journal | Proc. SPIE 12494, Optical and EUV Nanolithography XXXVI | |
imec.availability | Published - open access |