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Printability and propagation of stochastic defects through a study o defects programmed on EUV mask
Publication:
Printability and propagation of stochastic defects through a study o defects programmed on EUV mask
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Date
2021
Proceedings Paper
https://doi.org/10.1117/12.2602034
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Das, Poulomi
;
Moussa, Alain
;
Beral, Christophe
;
Gupta, Mihir
;
Saib, Mohamed
;
Halder, Sandip
;
Charley, Anne-Laure
;
Leray, Philippe
Journal
na
Abstract
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416
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Acq. date: 2025-12-18
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1137
since deposited on 2023-06-20
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Acq. date: 2025-12-18
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Metrics
Downloads
416
since deposited on 2023-06-20
80
last month
26
last week
Acq. date: 2025-12-18
Views
1137
since deposited on 2023-06-20
1
last month
Acq. date: 2025-12-18
Citations