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Printability and propagation of stochastic defects through a study o defects programmed on EUV mask
dc.contributor.author | Das, Poulomi | |
dc.contributor.author | Moussa, Alain | |
dc.contributor.author | Beral, Christophe | |
dc.contributor.author | Gupta, Mihir | |
dc.contributor.author | Saib, Mohamed | |
dc.contributor.author | Halder, Sandip | |
dc.contributor.author | Charley, Anne-Laure | |
dc.contributor.author | Leray, Philippe | |
dc.date.accessioned | 2023-06-20T10:34:16Z | |
dc.date.available | 2023-06-20T10:34:16Z | |
dc.date.issued | 2021 | |
dc.identifier.isbn | 978-1-5106-4552-3 | |
dc.identifier.issn | 0277-786X | |
dc.identifier.other | WOS:000792657300015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41844 | |
dc.source | WOS | |
dc.title | Printability and propagation of stochastic defects through a study o defects programmed on EUV mask | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Das, Poulomi | |
dc.contributor.imecauthor | Moussa, Alain | |
dc.contributor.imecauthor | Beral, Christophe | |
dc.contributor.imecauthor | Gupta, Mihir | |
dc.contributor.imecauthor | Saib, Mohamed | |
dc.contributor.imecauthor | Halder, Sandip | |
dc.contributor.imecauthor | Charley, Anne-Laure | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
dc.contributor.orcidimec | Moussa, Alain::0000-0002-6377-4199 | |
dc.contributor.orcidimec | Beral, Christophe::0000-0003-1356-9186 | |
dc.contributor.orcidimec | Gupta, Mihir::0000-0003-0286-7997 | |
dc.contributor.orcidimec | Charley, Anne-Laure::0000-0003-4745-0167 | |
dc.contributor.orcidimec | Leray, Philippe::0000-0002-1086-270X | |
dc.identifier.doi | 10.1117/12.2602034 | |
dc.identifier.eisbn | 978-1-5106-4553-0 | |
dc.source.numberofpages | 9 | |
dc.source.peerreview | yes | |
dc.source.conference | International Conference on Extreme Ultraviolet Lithography | |
dc.source.conferencedate | SEP 27-OCT 01, 2021 | |
dc.source.volume | 11854 | |
imec.availability | Under review |
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