dc.contributor.author | Nye, Rachel | |
dc.contributor.author | Van Dongen, Kaat | |
dc.contributor.author | de Marneffe, Jean-Francois | |
dc.contributor.author | Parsons, Gregory N. N. | |
dc.contributor.author | Delabie, Annelies | |
dc.date.accessioned | 2023-12-15T09:53:24Z | |
dc.date.available | 2023-06-25T20:34:42Z | |
dc.date.available | 2023-12-15T09:53:24Z | |
dc.date.issued | 2023 | |
dc.identifier.issn | 2196-7350 | |
dc.identifier.other | WOS:001007482600001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/42091.2 | |
dc.source | WOS | |
dc.title | Quantified Uniformity and Selectivity of TiO2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition Supercycles | |
dc.type | Journal article | |
dc.contributor.imecauthor | Van Dongen, Kaat | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.imecauthor | Nye, Rachel | |
dc.contributor.orcidimec | de Marneffe, Jean-Francois::0000-0001-5178-6670 | |
dc.contributor.orcidimec | Delabie, Annelies::0000-0001-9739-7419 | |
dc.date.embargo | 2023-07-17 | |
dc.identifier.doi | 10.1002/admi.202300163 | |
dc.source.numberofpages | 11 | |
dc.source.peerreview | yes | |
dc.source.beginpage | Art. 2300163 | |
dc.source.endpage | na | |
dc.source.journal | ADVANCED MATERIALS INTERFACES | |
dc.source.issue | 20 | |
dc.source.volume | 10 | |
imec.availability | Published - open access | |