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TOFSIMS evaluation of the removal of resists on silicon by ozone-based cleaning

dc.contributor.authorConard, Thierry
dc.contributor.authorKenens, Conny
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorClaes, Martine
dc.contributor.authorLagrange, Sébastien
dc.contributor.authorWorthA, W.
dc.contributor.authorJassal, S.
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-14T12:45:41Z
dc.date.available2021-10-14T12:45:41Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4218
dc.sourceIIOimport
dc.titleTOFSIMS evaluation of the removal of resists on silicon by ozone-based cleaning
dc.typeProceedings paper
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage631
dc.source.endpage634
dc.source.conferenceSecondary Ion Mass Spectrometry - SIMS XII. Proceedings of the 12th International Conference
dc.source.conferencedate5/09/1999
dc.source.conferencelocationBrussel Belgium
imec.availabilityPublished - open access


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