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Unbiased roughness measurements for 0.55NA EUV material setup

dc.contributor.authorMathew, Bobin
dc.contributor.authorArad, Shahar
dc.contributor.authorBrand, Omri
dc.contributor.authorFrank, Tal
dc.contributor.authorAlkoken, Ran
dc.contributor.authorShilo, Yael
dc.contributor.authorMelamed, Yarden
dc.contributor.authorYosef, Rotem Mor
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorHeo, Seonggil
dc.contributor.authorHalder, Sandip
dc.date.accessioned2023-10-13T07:38:26Z
dc.date.available2023-07-28T17:39:56Z
dc.date.available2023-10-13T07:38:26Z
dc.date.issued2023
dc.identifier.isbn978-1-5106-6099-1
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001022962000003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42234.2
dc.sourceWOS
dc.titleUnbiased roughness measurements for 0.55NA EUV material setup
dc.typeProceedings paper
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.imecauthorHeo, Seonggil
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecHeo, Seonggil::0009-0007-1447-7183
dc.date.embargo2023-03-02
dc.identifier.doi10.1117/12.2658505
dc.identifier.eisbn978-1-5106-6100-4
dc.source.numberofpages8
dc.source.peerreviewyes
dc.source.beginpageArt. 1249607
dc.source.conferenceConference on Metrology, Inspection, and Process Control XXXVII
dc.source.conferencedateFEB 27-MAR 02, 2023
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.volume12496
imec.availabilityPublished - open access


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220.500.12860/42234.2*2023-10-13T07:37:00Zvalidation by library/open access desk
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