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Reaction Mechanisms and EB Patterning Evaluation of Sn-complex-side-chain Polymer Used for EUV Lithography

dc.contributor.authorTakata, Yui
dc.contributor.authorMuroya, Yusa
dc.contributor.authorKozawa, Takahiro
dc.contributor.authorEnomoto, Satoshi
dc.contributor.authorNaqvi, Bilal
dc.contributor.authorDe Simone, Danilo
dc.date.accessioned2024-06-04T09:39:21Z
dc.date.available2023-07-28T17:39:56Z
dc.date.available2024-06-04T09:39:21Z
dc.date.issued2023
dc.identifier.isbn978-1-5106-6103-5
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001022961000054
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42238.3
dc.sourceWOS
dc.titleReaction Mechanisms and EB Patterning Evaluation of Sn-complex-side-chain Polymer Used for EUV Lithography
dc.typeProceedings paper
dc.contributor.imecauthorNaqvi, Bilal
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecNaqvi, Bilal::0000-0002-9080-6475
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.identifier.doi10.1117/12.2670173
dc.identifier.eisbn978-1-5106-6104-2
dc.source.numberofpages2
dc.source.peerreviewyes
dc.source.beginpage1249826
dc.source.conferenceConference on Advances in Patterning Materials and Processes XL
dc.source.conferencedateFEB 27-MAR 01, 2023
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.volume12498
imec.availabilityPublished - imec


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320.500.12860/42238.3*2024-06-04T09:37:39Zvalidation by library/open access desk
120.500.12860/422382023-07-28T17:39:56Z

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