Show simple item record

Vapor phase decomposition - droplet collection evalutation of a wafer surface preparation system

dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorArnauts, Sophia
dc.contributor.authorWitters, Thomas
dc.contributor.authorBoehme, W.
dc.contributor.authorGonchond, J. P.
dc.contributor.authorHuber, A.
dc.contributor.authorLerche, J.
dc.contributor.authorLoewenstein, Lee
dc.contributor.authorRink, I.
dc.contributor.authorWortelboer, R.
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T12:48:00Z
dc.date.available2021-10-14T12:48:00Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4253
dc.sourceIIOimport
dc.titleVapor phase decomposition - droplet collection evalutation of a wafer surface preparation system
dc.typeProceedings paper
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage593
dc.source.endpage600
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing. Proceedings of the 6th International Symposium
dc.source.conferencedate17/10/1999
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. PV 99-36


Files in this item

Thumbnail
Name:
4234.pdf
Size:
1.761Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record